Strapping Structure of Memory Circuit

ABSTRACT

A memory circuit includes a first memory cell and a second memory adjacent to the first memory cell. The first memory cell includes a first word line strapping line segment electrically coupled with a pass device of the first memory cell; and a second word line strapping line segment. The second memory cell includes a first word line strapping line segment; and a second word line strapping line segment electrically coupled with a pass device of the second memory cell. The first word line strapping line segment of the first memory cell and the first word line strapping line segment of the second memory cell are connected with each other at a first interconnection layer. The second word line strapping line segment of the first memory cell and the second word line strapping line segment of the second memory cell are connected with each other at the first interconnection layer.

PRIORITY CLAIM

This application is a continuation of U.S. patent application Ser. No. 15/887,210, filed on Feb. 2, 2018, and entitled “Strapping Structure of Memory Circuit” is a divisional of U.S. patent application Ser. No. 14/723,615, filed May 28, 2015, now U.S. Pat. No. 9,911,727 issued on Mar. 6, 2018, and entitled “Strapping Structure of Memory Circuit” which claims priority to U.S. Provisional Patent Application No. 62/133,928, filed Mar. 16, 2015. The entire contents of the above-referenced applications are incorporated by reference herein.

RELATED APPLICATIONS

The present application is related to U.S. patent application Ser. No. 12/039,711, filed on Feb. 28, 2008, now U.S. Pat. No. 7,920,403 issued on Apr. 5, 2011, and entitled “ROM CELL CONNECTION STRUCTURE,” and U.S. patent application Ser. No. 12/827,406, filed on Jun. 30, 2010, now U.S. Pat. No. 8,212,295 issued on Jul. 3, 2012, and entitled “ROM CELL CIRCUIT FOR FINFET DEVICES”. The entire contents of the above-referenced applications are incorporated by reference herein.

BACKGROUND

The semiconductor integrated circuit (IC) industry has experienced rapid growth. Technological advances in IC materials and design have produced generations of ICs, where each generation has smaller and more complex circuits than the previous generation. In the course of integrated circuit evolution, functional density (i.e., the number of interconnected devices per chip area) has generally increased while geometry size (i.e., the smallest component or line that can be created using a fabrication process) has decreased. In some applications, a memory array includes rows of gate electrodes electrically connecting various rows of pass devices of memory cells of the memory array. When the width of a conductive structure, such as the gate electrode structures in the memory array, becomes smaller, the unit-length resistance of the conductive structure becomes greater. In some applications, a digital signal transmitted on a conductive structure has a longer rising or falling time when the unit-length resistance thereof becomes greater. In some applications, the speed of turning on or off pass devices of different memory cells at different location of the memory array thus varies.

BRIEF DESCRIPTION OF THE DRAWINGS

Aspects of the present disclosure are best understood from the following detailed description when read with the accompanying figures. It is noted that, in accordance with the standard practice in the industry, various features are not drawn to scale. In fact, the dimensions of the various features may be arbitrarily increased or reduced for clarity of discussion.

FIG. 1A is a schematic circuit diagram of two read-only memory (ROM) cells in a ROM circuit, in accordance with some embodiments.

FIG. 1B is a schematic circuit diagram of two read-only memory (ROM) cells in another ROM circuit, in accordance with some embodiments.

FIG. 2A is a top view of four ROM cells of a ROM circuit based on ROM cells of FIG. 1A, with all the depictions regarding components in and above a second interconnection layer of the ROM circuit omitted, in accordance with some embodiments.

FIG. 2B is a top view of the four ROM cells of FIG. 2A, with the depictions regarding components from a first interconnection layer to the second interconnection layer of the ROM circuit, in accordance with some embodiments.

FIG. 3 is a cross-sectional view of the ROM circuit of FIGS. 2A and 2B taken from reference line A-A′, in accordance with some embodiments.

FIG. 4 is a routing diagram of a portion of a memory circuit implemented based on ROM cells of FIGS. 2A and 2B, in accordance with some embodiments.

FIG. 5 is a top view of a plurality of ROM cells and four strapping cells of a ROM circuit based on ROM cells of FIG. 1A or FIG. 1B, with the depictions regarding some components of the ROM cells omitted, in accordance with some embodiments.

FIG. 6 is a top view of a plurality of ROM cells and four strapping cells of another ROM circuit based on ROM cells of FIG. 1A or FIG. 1B, with the depictions regarding some components of the ROM cells omitted, in accordance with some embodiments.

FIG. 7 is a routing diagram of a memory device having strapping cells of FIG. 5 and/or FIG. 6, in accordance with some embodiments.

DETAILED DESCRIPTION

The following disclosure provides many different embodiments, or examples, for implementing different features of the invention. Specific examples of components and arrangements are described below to simplify the present disclosure. These are, of course, merely examples and are not intended to be limiting. For example, the formation of a first feature over or on a second feature in the description that follows may include embodiments in which the first and second features are formed in direct contact, and may also include embodiments in which additional features may be formed between the first and second features, such that the first and second features may not be in direct contact. In addition, the present disclosure may repeat reference numerals and/or letters in the various examples. This repetition is for the purpose of simplicity and clarity and does not in itself dictate a relationship between the various embodiments and/or configurations discussed.

Further, spatially relative terms, such as “beneath,” “below,” “lower,” “above,” “upper” and the like, may be used herein for ease of description to describe one element or feature's relationship to another element(s) or feature(s) as illustrated in the figures. The spatially relative terms are intended to encompass different orientations of the device in use or operation in addition to the orientation depicted in the figures. The apparatus may be otherwise oriented (rotated 90 degrees or at other orientations) and the spatially relative descriptors used herein may likewise be interpreted accordingly.

In accordance with some embodiments of the present disclosure, two adjacent read-only memory (ROM) cells of the same row in a ROM circuit share word line strapping structures implemented along the cell boundaries thereof at a first interconnection layer to reduce the equivalent unit-length resistance of the word line structure of the ROM circuit. In accordance with some embodiments of the present disclosure, two adjacent strapping cells of the same column share at least one strapping line at the first interconnection layer.

FIG. 1A is a schematic circuit diagram of two ROM cells 110[i] and 110[i+1] in a ROM circuit 100A in accordance with some embodiments. Index “i” is a positive integer greater than zero.

ROM circuit 100A includes word lines WL[i] and WL[i+1] and a bit line BL. Word line WL[i] is electrically coupled with ROM cell 110[i]; and word line WL[i+1] is electrically coupled with ROM cell 110[i+1]. Bit line BL is electrically coupled with ROM cells 110[i] and 110[i+1]. ROM circuit 100A also includes an isolation device 122 that is shared by and configured to electrically isolate adjacent ROM cells. In some embodiments, ROM circuit 100A includes a plurality of ROM cell pairs having a configuration similar to ROM cells 110[i] and 110[i+1].

ROM cell 110[i] includes a pass device 112[i] and a coding switch 114[i]. Pass device 112[i] is an N-type transistor and also referred to as transistor 112[i]. A drain terminal of transistor 112[i] is electrically coupled with bit line BL. A gate terminal of transistor 112[i] is electrically coupled with word line WL[i]. A source terminal of transistor 112[i] is electrically coupled with coding switch 114[i]. Coding switch 114[i] is disposed between transistor 112[i] and a reference voltage node 116[i]. Coding switch 114[i] is set to be “open” or at a high resistance state to store a predetermined logic value, such as a logic high value. Reference voltage node 116[i] is configured to receive a reference voltage VSS. ROM cell 110[i+1] includes a pass device 112[i+1] implemented by an N-type transistor and a coding switch 114[i+1] coupled with bit line BL, word line WL[i+1], and reference voltage node 116[i+1] in a manner similar to ROM cell 110[i], except coding switch 114[i+1] is set to be “closed” or at a low resistance state to store another predetermined logic value, such as a logic low value.

In some embodiments, coding switches 114[i] and 114[i+1] are implemented by selectively forming or omitting one or more conductive via plugs or conductive lines between bit line BL and the corresponding pass device 112[i] or 112[i+1]. In such a configuration, the logic values stored in ROM cells 110[i] and 110[i+1] are hardwired after fabrication of the ROM circuit 100A. In some embodiments, coding switches 114[i] and 114[i+1] are implemented by e-fuse devices. In such a configuration, the logic values stored in ROM cells 110[i] and 110[i+1] are programmable or one-time programmable after the ROM circuit 100A is fabricated.

Isolation device 122 is configured to electrically isolate coding switches 114[i] and 114[i+1] of corresponding ROM cells 110[i] and 110[i+1]. Isolation device 122 is implemented by an N-type transistor and also referred to as transistor 122. A gate terminal of transistor 122 is electrically coupled with a reference voltage node 124. A first drain/source terminal of transistor 122 is electrically coupled with coding switch 114[i] of ROM cell 110[i]. A second drain/source terminal of transistor 122 is electrically coupled with coding switch 114[i+1] of ROM cell 110[i+1]. Reference voltage node 124 is also configured to receive reference voltage VSS. A voltage level of reference voltage VSS is set to be sufficient to turn off transistor 122.

FIG. 1B is a schematic circuit diagram of two read-only memory (ROM) cells 130[i] and 130[i+1] in another ROM circuit 100B in accordance with some embodiments. Components of FIG. 1B that are the same or similar to those of FIG. 1A are given the same reference labels, and detailed description thereof is thus omitted.

ROM circuit 100B includes word lines WL[i] and WL[i+1] and a bit line BL. ROM circuit 100B also includes an isolation device 122 configured to electrically isolate adjacent ROM cells. In some embodiments, ROM circuit 100B includes a plurality of ROM cell pairs having a configuration similar to ROM cells 130[i] and 130[i+1].

ROM cell 130[i] includes a pass device 132[i] and a coding switch 134[i]. Pass device 132[i] is an N-type transistor. A drain terminal of transistor 132[i] is electrically coupled with coding switch 134[i]. A gate terminal of transistor 132[i] is electrically coupled with word line WL[i]. A source terminal of transistor 112[i] is electrically coupled with a reference voltage node 136[i]. Reference voltage node 136[i] is configured to receive a reference voltage VSS. Coding switch 134[i] is disposed between transistor 132[i] and bit line BL. Coding switch 114[i] is set to be “open” or at a high resistance state to store a predetermined logic value, such as a logic high value. ROM cell 130[i+1] includes a pass device 132[i+1] implemented by an N-type transistor and a coding switch 134[i+1] coupled with bit line BL, word line WL[i+1], and reference voltage node 136[i+1] in a manner similar to ROM cell 130[i], except coding switch 134[i+1] is set to be “closed” or at a low resistance state to store another predetermined logic value, such as a logic low value.

In some embodiments, coding switches 134[i] and 134[i+1] are implemented by selectively forming or omitting one or more conductive via plugs or conductive lines. In such configuration, the logic values stored in ROM cells 130[i] and 130[i+1] are hardwired after fabrication of the ROM circuit 100B. In some embodiments, coding switches 134[i] and 134[i+1] are implemented by e-fuse devices. In such a configuration, the logic values stored in ROM cells 130[i] and 130[i+1] are programmable or one-time programmable after the ROM circuit 100B is fabricated.

In some embodiments, the layout designs for implementing ROM circuit 100A and ROM circuit 100B are the same at the transistor portion thereof and differ at the via and interconnection layers.

FIG. 2A is a top view of four ROM cells 210-11, 210-12, 210-21, and 210-22 of a ROM circuit 200 based on ROM cells 110[i] and 110[i+1] of FIG. 1A, with all the depictions regarding components in and above a second interconnection layer of the ROM circuit 200 omitted, in accordance with some embodiments. Details regarding the second interconnection layer of the ROM circuit 200 are illustrated in conjunction with FIG. 3.

ROM cells 210-11, 210-12, 210-21, and 210-22 are identified in FIG. 2A by dotted lines representing reference cell boundaries thereof. FIG. 2A also depicts reference lines X₁, X₂, and X₃ extending along a Y direction and reference lines Y₁, Y₂, and Y₃ extending along an X direction. Cell boundaries of ROM cell 210-11 extend along reference line X₁, reference line X₂, reference line Y₁, and reference line Y₂. Cell boundaries of ROM cell 210-12 extend along reference line X₁, reference line X₂, reference line Y₂, and reference line Y₃. Cell boundaries of ROM cell 210-21 extend along reference line X₂, reference line X₃, reference line Y₁, and reference line Y₂. Cell boundaries of ROM cell 210-22 extend along reference line X₂, reference line X₃, reference line Y₂, and reference line Y₃.

In some embodiments, a Y direction is also referred to as a column direction of ROM circuit 200, and an X direction is also referred to as a row direction of ROM circuit 200.

ROM circuit 200 includes gate strips 222, 224, 226, and 228 extending along the X direction, fin structures 232 and 234 extending along the Y direction, contact structures 242, 244, 252, 254, 256, and 258 extending along the X direction, and conductive lines 262, 264, 266, 268, 272, 274, and 276 extending along the Y direction. In some embodiments, conductive lines 262, 264, 266, 268, 272, 274, and 276 are in a first interconnection layer of ROM circuit 200. The second interconnection layer is disposed above the first interconnection layer. Details regarding the first interconnection layer of the ROM circuit 200 are illustrated in conjunction with FIG. 3.

ROM circuit 200 also includes various via plugs at a first via plug layer (labeled as V1 or V1_Coding) and gate contact structures GC disposed to electrically connecting various gate strips, contact structures, or conductive lines.

Fin structures 232 and 234 and conductive lines 262, 264, 266, and 268 extend beyond ROM cells 210-11, 210-12, 210-21, and 210-22 and are usable as parts of the ROM cells of ROM circuit 200 that are not depicted in FIG. 2A.

ROM cell 210-11 includes a first gate structure 222 a, a second gate structure 226 a, a first word line strapping line segment 274 a, a second word line strapping line segment 272 a, a bit line segment 262 a, and a reference voltage line segment 264 a. First gate structure 222 a is a portion of gate strip 222 that is within an area from reference line X₁ to reference line X₂. Second gate structure 226 a is a portion of gate strip 226 that is within an area from reference line X₁ to reference line X₂. First word line strapping line segment 274 a is a portion of conductive line 274 that is within an area from reference line Y₁ to reference line Y₂. Second word line strapping line segment 272 a is a portion of conductive line 272 that is within an area from reference line Y₁ to reference line Y₂. Bit line segment 262 a is a portion of conductive line 262 that is within an area from reference line Y₁ to reference line Y₂. Reference voltage line segment 264 a is a portion of conductive line 264 that is within an area from reference line Y₁ to reference line Y₂. ROM cell 210-11 also includes a portion of fin structure 232 within an area from reference line Y₁ to reference line Y₂.

In some embodiments, ROM cell 210-11 corresponds to ROM cell 110[i] in FIG. 1A, and Bit line segment 262 a corresponds to bit line BL in FIG. 1A. In some embodiments, reference voltage line segment 264 a corresponds to reference voltage nodes 116[i] and 124 and is configured to receive reference voltage VSS. Fin structures 232, first gate structure 222 a, and contact structures 242 and 254 together correspond to pass device 112[i] (FIG. 1A). Fin structures 232, second gate structure 226 a, and contact structure 254, and a counterpart contact structure (not shown) on an opposite side of second gate structure 226 a together correspond to isolation device 122 (FIG. 1A).

First gate structure 222 a corresponds to the gate terminal of transistor 112[i]. Contact structure 242 corresponds to drain terminal of transistor 112[i] and is electrically connected with bit line segment 262 a through a corresponding via plug V1. Contact structure 254 corresponds to source terminal of transistor 112[i] and is electrically connected with reference voltage line segment 264 a through a corresponding via plug V1_Coding to store a logic low value.

Second gate structure 226 a corresponds to the gate terminal of transistor 122 and is electrically connected with reference voltage line segment 264 a through a corresponding via plug V1 and a corresponding gate contact structure GC to turn off transistor 122. Contact structure 254 corresponds to the first drain/source terminal of transistor 122. The counterpart contact structure (not shown) on the opposite side of second gate structure 226 a corresponds to the second drain/source terminal of transistor 122.

First word line strapping line segment 274 a extends along reference line X₂ and is electrically connected with first gate structure 222 a through a via plug V1-1 and a gate contact structure GC-1. Second word line strapping line segment 272 a extends along reference line X₁ and is free from being electrically connected with first gate structure 222 a within the cell boundaries of ROM cell 210-11.

ROM cell 210-12 includes a first gate structure 224 a, a second gate structure 228 a, a first word line strapping line segment 274 b, a second word line strapping line segment 272 b, a bit line segment 262 b, and a reference voltage line segment 264 b. First gate structure 224 a is a portion of gate strip 224 that is within an area from reference line X₁ to reference line X₂. Second gate structure 228 a is a portion of gate strip 228 that is within an area from reference line X₁ to reference line X₂. First word line strapping line segment 274 b is a portion of conductive line 274 that is within an area from reference line Y₂ to reference line Y₃. Second word line strapping line segment 272 b is a portion of conductive line 272 that is within an area from reference line Y₂ to reference line Y₃. Bit line segment 262 b is a portion of conductive line 262 that is within an area from reference line Y₂ to reference line Y₃. Reference voltage line segment 264 b is a portion of conductive line 264 that is within an area from reference line Y₂ to reference line Y₃. ROM cell 210-12 also includes a portion of fin structure 232 within an area from reference line Y₂ to reference line Y₃.

First gate structure 224 a, second gate structure 228 a, first word line strapping line segment 274 b, second word line strapping line segment 272 b, bit line segment 262 b, and reference voltage line segment 264 b of ROM cell 210-12 correspond to first gate structure 222 a, second gate structure 224 a, first word line strapping line segment 274 a, second word line strapping line segment 272 a, bit line segment 262 a, and reference voltage line segment 264 a of ROM cell 210-11, and detailed description thereof is thus omitted. Contact structure 242 corresponds to a drain terminal of the pass device of ROM cell 210-12. Contact structure 252 corresponds to a source terminal of the pass device of ROM cell 210-12 and a drain/source terminal of isolation device of ROM cell 210-12.

Word line strapping line segment 274 a and word line strapping line segment 274 b are connected with each other at the first interconnection layer of the ROM circuit 200. Word line strapping line segment 272 a and word line strapping line segment 272 b are connected with each other at the first interconnection layer of the ROM circuit 200.

Bit line segment 262 a and the bit line segment 262 b are connected with each other at the first interconnection layer of the ROM circuit 200. Reference voltage line segment 264 a and the reference voltage line segment 264 b are connected with each other at the first interconnection layer of the ROM circuit 200.

Compared with ROM cell 210-11, first word line strapping line segment 274 b is free from being electrically connected with first gate structure 224 a within the cell boundaries of ROM cell 210-12. Also, second word line strapping line segment 272 b is electrically connected with first gate structure 224 a through a via plug V1-2 and a gate contact structure GC-2.

ROM cell 210-21 includes a first gate structure 222 b, a second gate structure 226 b, a first word line strapping line segment 276 a, a second word line strapping line segment 274 a, a bit line segment 266 a, and a reference voltage line segment 268 a. First gate structure 222 b is a portion of gate strip 222 that is within an area from reference line X₂ to reference line X₃. Second gate structure 226 b is a portion of gate strip 226 that is within an area from reference line X₂ to reference line X₃. Gate structures 222 a and 222 b are connected with each other. Gate structures 224 a and 224 b are connected with each other.

First word line strapping line segment 276 a is a portion of conductive line 276 that is within an area from reference line Y₁ to reference line Y₂. Second word line strapping line segment 274 a is the same contact structure used as first word line strapping line segment 274 a of ROM cell 210-11. Bit line segment 266 a is a portion of conductive line 266 that is within an area from reference line Y₁ to reference line Y₂. Reference voltage line segment 268 a is a portion of conductive line 268 that is within an area from reference line Y₁ to reference line Y₂. ROM cell 210-21 also includes a portion of fin structure 234 within an area from reference line Y₁ to reference line Y₂.

First gate structure 222 b, second gate structure 226 b, first word line strapping line segment 276 a, second word line strapping line segment 274 a, bit line segment 266 a, and reference voltage line segment 268 a of ROM cell 210-21 correspond to first gate structure 222 a, second gate structure 224 a, first word line strapping line segment 274 a, second word line strapping line segment 272 a, bit line segment 262 a, and reference voltage line segment 264 a of ROM cell 210-11, and detailed description thereof is thus omitted. Contact structure 244 corresponds to a drain terminal of the pass device of ROM cell 210-21. Contact structure 258 corresponds to a source terminal of the pass device of ROM cell 210-21 and a drain/source terminal of isolation device of ROM cell 210-21.

Compared with ROM cell 210-11, first word line strapping line segment 276 a is free from being electrically connected with first gate structure 222 b within the cell boundaries of ROM cell 210-21. Also, second word line strapping line segment 274 a is electrically connected with first gate structure 222 b through via plug V1-1 and gate contact structure GC-1. Contact structure 258 is not electrically connected with reference voltage line segment 268 a to store a logic high value.

ROM cell 210-22 includes a first gate structure 224 b, a second gate structure 228 b, a first word line strapping line segment 276 b, a second word line strapping line segment 274 b, a bit line segment 266 b, and a reference voltage line segment 268 b. First gate structure 224 b is a portion of gate strip 226 that is within an area from reference line X₂ to reference line X₃. Second gate structure 228 b is a portion of gate strip 228 that is within an area from reference line X₂ to reference line X₃. Gate structures 226 a and 226 b are connected with each other. Gate structures 228 a and 228 b are connected with each other.

First word line strapping line segment 276 b is a portion of conductive line 276 that is within an area from reference line Y₂ to reference line Y₃. Second word line strapping line segment 274 b is a portion of conductive line 274 that is within an area from reference line Y₂ to reference line Y₃. Second word line strapping line segment 274 b is the same contact structure used as first word line strapping line segment 274 b of ROM cell 210-12. Bit line segment 266 b is a portion of conductive line 266 that is within an area from reference line Y₂ to reference line Y₃. Reference voltage line segment 268 b is a portion of conductive line 268 that is within an area from reference line Y₂ to reference line Y₃. ROM cell 210-22 also includes a portion of fin structure 234 within reference line Y₂ to reference line Y₃.

First gate structure 224 b, second gate structure 228 b, first word line strapping line segment 276 b, second word line strapping line segment 274 b, bit line segment 266 b, and reference voltage line segment 268 b of ROM cell 210-22 correspond to first gate structure 222 a, second gate structure 224 a, first word line strapping line segment 274 a, second word line strapping line segment 272 a, bit line segment 262 a, and reference voltage line segment 264 a of ROM cell 210-11, and detailed description thereof is thus omitted. Contact structure 244 corresponds to a drain terminal of the pass device of ROM cell 210-22. Contact structure 256 corresponds to a source terminal of the pass device of ROM cell 210-22 and a drain/source terminal of isolation device of ROM cell 210-22.

Word line strapping line segment 276 a and word line strapping line segment 276 b are connected with each other at the first interconnection layer of the ROM circuit 200. Bit line segment 266 a and the bit line segment 266 b are connected with each other at the first interconnection layer of the ROM circuit 200. Reference voltage line segment 268 a and the reference voltage line segment 268 b are connected with each other at the first interconnection layer of the ROM circuit 200.

Compared with ROM cell 210-11, first word line strapping line segment 276 b is also electrically connected with first gate structure 224 b through a via plug V1-3 and a gate contact structure GC-3. Second word line strapping line segment 274 b is free from being electrically connected with first gate structure 224 b within the cell boundaries of ROM cell 210-22.

Furthermore, fin structures 232 includes three fin structures extending along Y direction, and fin structures 234 includes three fin structures extending along Y direction. In some embodiments, fin structures 232 and fin structures 234 each have more or less than three fin structures. In some embodiments, fin structures 232 and fin structures 234 are manufactured by forming a plurality of parallel find structures than removing one or more fin structures that are within the gap region 236. In some embodiments, a width of gap region 236 is sufficient to accommodate word line strapping line segments and corresponding via plugs for forming a word line strapping structure. In such circumstances, inclusion of word line strapping structures as illustrated in FIG. 2A does not demand for additional area penalty for ROM circuit 200.

FIG. 2B is a top view of the four ROM cells 210-11, 210-12, 210-21, and 210-22 of FIG. 2A, with the depictions regarding components from the first interconnection layer to the second interconnection layer of the ROM circuit 200, in accordance with some embodiments. Components that are the same or similar to those in FIG. 2A are given the same reference numbers, and detailed description thereof is thus omitted.

ROM circuit 200 further includes conductive lines 282, 284, 286, and 288 extending along X direction. In some embodiments, conductive lines 282, 284, 286, and 288 are in the second interconnection layer of ROM circuit 200. ROM circuit 200 also includes various via plugs at a second via plug layer (labeled as V2) disposed to electrically connecting various conductive lines between the first interconnection layer and the second interconnection layer of ROM circuit 200.

ROM cell 210-11 includes a word line segment 282 a and a reference voltage line segment 286 a. Word line segment 282 a is a portion of conductive line 282 that is within an area from reference line X₁ to reference line X₂. Reference voltage line segment 286 a is a portion of conductive line 286 that is within an area from reference line X₁ to reference line X₂. Word line segment 282 a corresponds to word line WL[i] in FIG. 1A. Reference voltage line segment 286 a corresponds to reference voltage nodes 116[i] and 124 and is configured to receive reference voltage VSS.

Word line segment 282 a is electrically connected with first word line strapping line segment 274 a through a via plug V2-1 and is free from being electrically connected with second word line strapping line segment 272 a within the cell boundaries of ROM cell 210-11. Reference voltage line segment 286 a is electrically connected with conductive line 264 through a corresponding via plug V2.

ROM cell 210-12 includes a word line segment 284 a and a reference voltage line segment 288 a. Word line segment 284 a is a portion of conductive line 284 that is within an area from reference line X₁ to reference line X₂. Reference voltage line segment 288 a is a portion of conductive line 288 that is within an area from reference line X₁ to reference line X₂. Word line segment 284 a and reference voltage line segment 288 a correspond to word line segment 282 a and reference voltage line segment 286 a of ROM cell 210-11, and detailed description thereof is thus omitted.

Compared with ROM cell 210-11, word line segment 284 a is electrically connected with second word line strapping line segment 272 b through a via plug V2-2 and is not electrically connected with first word line strapping line segment 274 b within the cell boundaries of ROM cell 210-12. Reference voltage line segment 288 a is electrically connected with conductive line 264 through a corresponding via plug V2.

ROM cell 210-21 includes a word line segment 282 b and a reference voltage line segment 286 b. Word line segment 282 b is a portion of conductive line 282 that is within an area from reference line X₂ to reference line X₃. Reference voltage line segment 286 b is a portion of conductive line 286 that is within an area from reference line X₂ to reference line X₃. Word line segments 282 a and 282 b are connected with each other at the second interconnection layer of ROM circuit 200. Reference voltage line segments 286 a and 286 b are connected with each other at the second interconnection layer of ROM circuit 200. Word line segment 282 b and reference voltage line segment 284 b correspond to word line segment 282 a and reference voltage line segment 286 a of ROM cell 210-11, and detailed description thereof is thus omitted.

Compared with ROM cell 210-11, word line segment 282 b is electrically connected with second word line strapping line segment 274 a through via plug V2-1, which is the same word line strapping line segment configured as first word line strapping line segment 274 a of ROM cell 210-11. Also, word line segment 282 b is free from being electrically connected with first word line strapping line segment 276 a within the cell boundaries of ROM cell 210-21. Reference voltage line segment 286 b is electrically connected with conductive line 268 through a corresponding via plug V2.

ROM cell 210-22 includes a word line segment 284 b and a reference voltage line segment 288 b. Word line segment 284 b is a portion of conductive line 284 that is within an area from reference line X₂ to reference line X₃. Reference voltage line segment 288 b is a portion of conductive line 288 that is within an area from reference line X₂ to reference line X₃. Word line segments 284 a and 284 b are connected with each other at the second interconnection layer of ROM circuit 200. Reference voltage line segments 288 a and 288 b are connected with each other at the second interconnection layer of ROM circuit 200. Word line segment 284 b and reference voltage line segment 288 b correspond to word line segment 282 a and reference voltage line segment 286 a of ROM cell 210-11, and detailed description thereof is thus omitted.

Compared with ROM cell 210-11, word line segment 284 b is electrically connected with first word line strapping line segment 276 b through a via plug V2-3 and is free from being electrically connected with second word line strapping line segment 274 b within the cell boundaries of ROM cell 210-22. Second word line strapping line segment 274 b is configured as first word line strapping line segment 274 b of ROM cell 210-12. Reference voltage line segment 288 b is electrically connected with conductive line 268 through a corresponding via plug V2.

FIG. 3 is a cross-sectional view of ROM circuit 200 of FIGS. 2A and 2B taken from reference line A-A′ in accordance with some embodiments. Components in FIG. 3 that are the same or similar to those in FIGS. 2A and 2B are given the same reference numbers, and detailed description thereof is thus omitted. Reference line L₁ corresponds to the position where reference line X₁ intersects reference line A-A′. Reference line L₂ corresponds to the position where reference line X₂ intersects reference line A-A′. Reference line L₃ corresponds to the position where reference line X₃ intersects reference line A-A′.

ROM circuit 200 includes a substrate 310, a plurality of fin structures 232 and 234 over substrate 310, an isolation layer 320 over substrate 310 and surrounding fin structures 232 and 234, and a gate strip 224 over isolation layer 320 and fin structures 232 and 234. ROM circuit 200 also includes gate contact structures GC-2 and GC-3 over gate strip 224, via plugs V1-2 and V1-3 at a first via layer of ROM circuit 200 and over gate contact structures GC-2 and GC-3, conductive lines 262, 264, 266, 268, 272, 274, and 276 at a first interconnection layer of ROM circuit 200 and over the first via layer, via plugs V2-2 and V2-3 at a second via layer of ROM circuit 200 and over the first interconnection layer, and conductive line 284 at a second interconnection layer of ROM circuit 200 and over the second via layer.

Conductive line 284 is electrically coupled with gate strip 224 through via plug V2-2, conductive line 272, via plug V1-2, and gate contact structure GC-2 stacked along reference line L₁. Conductive line 284 is also electrically coupled with gate strip 224 through via plug V2-3, conductive line 276, via plug V1-3, and gate contact structure GC-3 stacked along reference line L3.

In some embodiments, substrate 310 includes: an elementary semiconductor such as silicon or germanium in crystal, polycrystalline, or an amorphous structure; a compound semiconductor including silicon carbide, gallium arsenide, gallium phosphide, gallium nitride, indium phosphide, indium arsenide, and/or indium antimonide; an alloy semiconductor including SiGe, GaAsP, AlInAs, AlGaAs, GaInAs, GaInP, and/or GaInAsP; or combinations thereof. In at least one embodiment, substrate 310 is an alloy semiconductor substrate having a gradient SiGe feature in which the Si and Ge composition change from one ratio at one location to another ratio at another location of the gradient SiGe feature. In another embodiment, the alloy SiGe is formed over a silicon substrate. In yet another embodiment, a SiGe substrate is strained. In some embodiments, substrate 310 is a semiconductor on insulator. In some examples, substrate 310 includes an epitaxial layer or a buried layer. In other examples, substrate 310 has a multilayer structure, or substrate 310 includes a multilayer compound semiconductor structure.

In some embodiments, gate strips 222, 224, 226, and 228 are polysilicon gate structures or metal gate structures. In some embodiments, fin structures 232 and 234 are doped semiconductor materials usable as active regions or various transistors of ROM circuit 200. In some embodiments, contact structures 242, 244, 252, 254, 256, and 258 include a material such as polysilicon, silicide, or metal.

In some embodiments, via plugs V1, V1_Coding, or V2 has a material includes aluminum, copper, tungsten, a combination thereof, or other suitable materials. In some embodiments, gate contact structures GC has a material includes polysilicon, silicide, aluminum, copper, tungsten, a combination thereof, or other suitable materials. In some embodiments, conductive lines 262, 264, 266, 268, 272, 274, 276, and/or 284 has a material includes aluminum, copper, a combination thereof, or other suitable materials.

FIG. 4 is a routing diagram of a portion of a memory circuit 400 implemented based on ROM cells 210-11, 210-12, 210-21- and 210-22 of FIGS. 2A and 2B in accordance with some embodiments.

Memory circuit 400 includes a plurality of ROM cells arranged into columns COL[n−1], COL[n], COL[n+1], COL[n+2], and COL[n+3] and rows ROW[m−3], ROW[m−2], ROW[m−1], ROW[m], ROW[m+1], and ROW[m+2]. Each ROM cell of memory circuit 400 has a configuration similar to one of ROM cells 210-11, 210-12, 210-21, and 210-22 depicted in FIGS. 2A and 2B. Memory circuit 400 further includes a plurality of bit lines BL[n-1], BL[n], BL[n+1], BL[n+2], and BL[n+2] extending along direction Y at a first interconnection layer of memory circuit 400, a plurality of word lines WL[m−3], WL[m−2], WL[m−1], WL[m], WL[m+1], and WL[m+2] extending along the X direction at a second interconnection layer of memory circuit 400, a first set of reference voltage lines 410[n-1], 410[n], 410[n+1], 410[n+2], and 410[n+2] extending along the Y direction at the first interconnection layer, and a second set of reference voltage lines 420[k] and 420[k−1] extending along the X direction at the second interconnection layer. Indices “m,” “n,” “k” are integers usable to identify individual components in FIG. 4.

Memory circuit 400 includes a plurality of word line strapping structures (depicted as rectangles in FIG. 4) corresponding to word line strapping segments of FIG. 2A and a plurality of via plugs V1 and V1_Coding corresponding to via plugs V1 and V1_Coding of FIG. 2A. Area 430 corresponds to ROM cells 210-11, 210-12, 210-21, and 210-22 of FIGS. 2A and 2B. Memory circuit 400 is implemented by an array of duplicates of area 430 with via plugs V1_Coding selectively placed to record data.

Compared with FIG. 2, word lines WL[m−3]˜WL[m+2] also correspond to the position of the gate structures of pass devices of memory circuit 400, and reference voltage lines 420[k] and 420[k-1] also correspond to the position of the gate structures of isolation devices of memory circuit 400.

As depicted in FIG. 4, in each row ROW[m−3]˜ROW[m+2], every two adjacent ROM cells shared one word line stripping structure that is electrically connected to the corresponding word line WL[m−3]˜WL[m+2]. Also, each word line strapping structure does not extend beyond two corresponding, adjacent reference voltage lines 420[k] and 420[K−1]. In each column COL[n−1]˜COL[n+3], every two adjacent ROM cells between two corresponding, adjacent reference voltage lines 420[k] and 420[K−1] has two word line strapping structures: one word line strapping structure for a corresponding one word line of the two adjacent ROM cells.

Memory circuit 200 and 400 illustrated in conjunction with FIGS. 2A-4 are based on memory circuit 100A of FIG. 1A. In some embodiments, memory circuit 200 and 400 are modified to implement memory circuit 100B of FIG. 1A. For example, for memory cell 210-11, contact structure 242 corresponds to the source terminal of transistor 132[i] and is electrically connected with conductive line 264 through a corresponding via plug V1 instead of conductive line 262; and contact structure 254 corresponds to the drain terminal of transistor 132[i] and is electrically connected with conductive line 262 through a corresponding via plug V1_Coding instead of conductive line 264. For implementing a memory circuit based on memory circuit 100B, ROM cells 210-12, 210-21, and 210-22 are modified in a manner similar to the modification for ROM cell 210-11 illustrated above.

FIG. 5 is a top view of a plurality of ROM cells and four strapping cells of a ROM circuit 500 based on ROM cells of FIG. 1A or FIG. 1B, with the depictions regarding some components of the ROM cells omitted, in accordance with some embodiments. In some embodiments, ROM cells of FIG. 5 are different from ROM cells of FIG. 1A or FIG. 1B.

Memory circuit 500 includes a plurality of ROM cells arranged into columns COL[1], COL[2], COL[3], and COL[4] and rows ROW[1], ROW[2], ROW[3], and ROW[4]. Memory circuit 500 also includes a column of strapping cells COL[S]. In some embodiments, ROM cells memory circuit 500 are grouped into several memory arrays, where columns COL[1] and COL[2] belong to one of the memory arrays, and columns COL[3] and COL[4] belong to another one of the memory arrays. FIG. 5 depicts cell boundaries of various cells with fine, dotted lines.

Memory circuit 500 includes further includes bit lines BL[1], BL[2], BL[3], and BL[4] extending along direction Y at a first interconnection layer of memory circuit 500, a plurality of word lines WL[1], WL[1], WL[3], and WL[4] extending along the X direction at a second interconnection layer of memory circuit 500, a first set of reference voltage lines 510[1], 510[2], 510[3], and 510[4] extending along the Y direction at the first interconnection layer, and a second set of reference voltage lines 520[1], 520[2], and 520[3] extending along the X direction at the second interconnection layer. Memory circuit 500 also includes gate strips 530[1], 530[2], 530[3], and 530[4] corresponding to gate electrodes of pass devices of memory circuit 500 and gate strips 532[1], 532[2], and 532[3] corresponding to gate electrodes of isolation devices of memory circuit 500.

In some embodiments, each ROM cell has a configuration similar to one of ROM cells 210-11, 210-12, 210-21- and 210-22 illustrated in FIGS. 2A and 2B, and detailed description thereof is thus omitted. In some embodiments, each ROM cell has a configuration similar to one of ROM cells 210-11, 210-12, 210-21, and 210-22 illustrated in FIGS. 2A and 2B but free from having conductive lines 272, 274, and 276 and corresponding via plugs for forming word line strapping structures.

A strapping cell 542S (not labeled, positioned at row ROW[1] and column COL[S]) is between ROM cell 542L (not labeled, positioned at row ROW[1] and column COL[2]) and ROM cell 542R (not labeled, positioned at row ROW[1] and column COL[3]). Strapping cell 542S has a first gate structure that is a portion of gate strip 530[1] within the cell boundaries of strapping cell 542S. The first gate structure of strapping cell 542S is connected with a gate structure of a pass device of ROM cell 542L and a gate structure of a pass device of ROM cell 542R. Strapping cell 542S has a word line segment that is a portion of word line WL[1] within the cell boundaries of strapping cell 542S. The word line segment of strapping cell 542S is connected with a word line segment of ROM cell 542L and a word line segment of ROM cell 542R.

Strapping cell 542S has a first word line strapping line segment 552 a at the first interconnection layer of ROM circuit 500 and a second word line strapping line segment 554 a at the first interconnection layer of ROM circuit 500. First word line strapping line segment 552 a is connected with the first gate structure of strapping cell 542S through a corresponding gate contact structures GC and a corresponding via plug V1 at a first via layer. First word line strapping line segment 552 a is connected with the word line segment of strapping cell 542S through a corresponding via plug V2 at a second via layer. Therefore, a portion of word line WL[1], i.e., the word line segment of strapping cell 542S, is electrically coupled with gate strip 530[1] within the cell boundaries of strapping cell 542S.

Another strapping cell 544S (not labeled, positioned at row ROW[2] and column COL[S]) is between ROM cell 544L (not labeled, positioned at row ROW[2] and column COL[2]) and ROM cell 544R (not labeled, positioned at row ROW[2] and column COL[3]). Strapping cell 544S has a first gate structure that is a portion of gate strip 530[2] within the cell boundaries of strapping cell 544S. The first gate structure of strapping cell 544S is connected with a gate structure of a pass device of ROM cell 544L and a gate structure of a pass device of ROM cell 544R. Strapping cell 544S has a word line segment that is a portion of word line WL[2] within the cell boundaries of strapping cell 544S. The word line segment of strapping cell 544S is connected with a word line segment of ROM cell 544L and a word line segment of ROM cell 544R.

Strapping cell 544S has a first word line strapping line segment 552 b at the first interconnection layer of ROM circuit 500 and a second word line strapping line segment 554 b at the first interconnection layer of ROM circuit 500. Word line strapping line segments 552 a and 552 b are connected with each other, and word line strapping line segments 554 a and 554 b are connected with each other. Second word line strapping line segment 554 b is connected with the first gate structure of strapping cell 544S through a corresponding gate contact structures GC and a corresponding via plug V1 at the first via layer. First word line strapping line segment 554 b is connected with the word line segment of strapping cell 544S through a corresponding via plug V2 at the second via layer. Therefore, a portion of word line WL[2], i.e., the word line segment of strapping cell 544S, is electrically coupled with gate strip 530[2] within the cell boundaries of strapping cell 544S.

Strapping cell 546S (not labeled, positioned at row ROW[3] and column COL[S]) has word line strapping line segments 556 a and 558 a corresponding to word line strapping line segments 552 a and 554 a of strapping cell 542S. Strapping cell 548S (not labeled, positioned at row ROW[4] and column COL[S]) has word line strapping line segments 556 b and 558 b corresponding to word line strapping line segments 552 b and 554 b of strapping cell 544S. Strapping cell 546S and strapping cell 548S has a configuration as a duplicate of strapping cell 542S and strapping cell 544S, and detailed description thereof is thus omitted. In some embodiments, strapping cell 546S and strapping cell 548S has a configuration as a mirrored configuration of strapping cell 542S and strapping cell 544S, where word line WL[3] is electrically coupled with gate strip 530[3] through word line strapping line segment 558 a, and word line WL[4] is electrically coupled with gate strip 530[4] through word line strapping line segment 556 b.

FIG. 6 is a top view of a plurality of ROM cells and four strapping cells of another ROM circuit 600 based on ROM cells of FIG. 1A or FIG. 1B, with the depictions regarding some components of the ROM cells omitted, in accordance with some embodiments. In some embodiments, ROM cells of FIG. 5 are different from ROM cells of FIG. 1A or FIG. 1B.

Components in FIG. 6 that are the same or similar to those in FIG. 5 are given the same reference numbers, and detailed description thereof is thus omitted. FIG. 6 also depicts cell boundaries of various cells with fine, dotted lines.

A strapping cell 612S (not labeled, positioned at row ROW[1] and column COL[S]) is between ROM cell 612L (not labeled, positioned at row ROW[1] and column COL[2]) and ROM cell 612R (not labeled, positioned at row ROW[1] and column COL[3]). The cell boundaries of strapping cell 612S includes a left boundary along a reference line X₄ and a right boundary along a reference line X₅. Strapping cell 612S has a first gate structure that is a portion of gate strip 530[1] within the cell boundaries of strapping cell 612S. The first gate structure of strapping cell 612S is connected with a gate structure of a pass device of ROM cell 612L and a gate structure of a pass device of ROM cell 612R. Strapping cell 612S has a second gate structure that is a portion of gate strip 532[1] within the reference line X₄ and the reference line X₅. The second gate structure of strapping cell 612S is connected with a gate structure of an isolation device of ROM cell 612L and a gate structure of an isolation device of ROM cell 612R. Strapping cell 612S has a word line segment that is a portion of word line WL[1] within the cell boundaries of strapping cell 612S. The word line segment of strapping cell 612S is connected with a word line segment of ROM cell 612L and a word line segment of ROM cell 612R.

Strapping cell 612S has an isolation gate strapping line segment 622 a at the first interconnection layer of ROM circuit 600 and a word line strapping line segment 632 at the first interconnection layer of ROM circuit 600.

Word line strapping line segment 632 is connected with the first gate structure of strapping cell 612S through a corresponding gate contact structures GC and a corresponding via plug V1 at a first via layer. Word line strapping line segment 632 is also connected with the word line segment of strapping cell 612S through a corresponding via plug V2 at a second via layer. Therefore, a portion of word line WL[1], i.e., the word line segment of strapping cell 612S, is electrically coupled with gate strip 530[1] within the cell boundaries of strapping cell 612S.

Isolation gate strapping line segment 622 a is connected with the second gate structure of strapping cell 612S through a corresponding gate contact structures GC and a corresponding via plug V1 at the first via layer. Isolation gate strapping line segment 622 a is also connected with the reference line 520[1] through a corresponding via plug V2 at the second via layer.

Another strapping cell 614S (not labeled, positioned at row ROW[2] and column COL[S]) is between ROM cell 614L (not labeled, positioned at row ROW[2] and column COL[2]) and ROM cell 614R (not labeled, positioned at row ROW[2] and column COL[3]). Strapping cell 614S has a first gate structure that is a portion of gate strip 530[2] within the cell boundaries of strapping cell 544S. The first gate structure of strapping cell 544S is connected with a gate structure of a pass device of ROM cell 614L and a gate structure of a pass device of ROM cell 614R. Strapping cell 614S has a second gate structure that is a portion of gate strip 532[2] within the reference line X₄ and the reference line X₅. The second gate structure of strapping cell 614S is connected with a gate structure of an isolation device of ROM cell 614L and a gate structure of an isolation device of ROM cell 614R. Strapping cell 614S has an isolation gate strapping line segment 622 b at the first interconnection layer of ROM circuit 600 and a word line strapping line segment 634 at the first interconnection layer of ROM circuit 600.

Word line strapping line segment 634 is connected with the first gate structure of strapping cell 614S through a corresponding gate contact structures GC and a corresponding via plug V1 at the first via layer. Word line strapping line segment 634 is also connected with the word line segment of strapping cell 614S through a corresponding via plug V2 at the second via layer. Therefore, a portion of word line WL[2], i.e., the word line segment of strapping cell 614S, is electrically coupled with gate strip 530[2] within the cell boundaries of strapping cell 614S.

Isolation gate strapping line segment 622 b is connected with the second gate structure of strapping cell 614S through a corresponding gate contact structures GC and a corresponding via plug V1 at the first via layer. Isolation gate strapping line segment 622 b is also connected with the reference line 520[2] through a corresponding via plug V2 at the second via layer. Isolation gate strapping line segment 622 a and Isolation gate strapping line segment 622 b are connected with each other.

Strapping cell 616S (not labeled, positioned at row ROW[3] and column COL[S]) has isolation gate strapping line segment 622 c and word line strapping line segment 636 corresponding to isolation gate strapping line segment 622 a and word line strapping line segment 632 of strapping cell 612S. Strapping cell 616S and strapping cell 614S shares the same isolation device. Isolation gate strapping line segment 622 b and Isolation gate strapping line segment 622 c are connected with each other. Strapping cell 618S (not labeled, positioned at row ROW[4] and column COL[S]) has isolation gate strapping line segment 622 d and word line strapping line segment 638 corresponding to isolation gate strapping line segment 622 b and word line strapping line segment 634 of strapping cell 614S. Isolation gate strapping line segment 622 c and Isolation gate strapping line segment 622 d are connected with each other. Strapping cell 616S and strapping cell 618S have a configuration as a duplicate of strapping cell 612S and strapping cell 614S, and detailed description thereof is thus omitted.

FIG. 7 is a routing diagram of a memory device 700 having strapping cells of FIG. 5 and/or FIG. 6, in accordance with some embodiments.

Memory device 700 includes memory cell arrays 712, 714, 716, and 718 and column edge cells 722 a, 722 b, 724 a, 724 b, 726 a, 726 b, 728 a, and 728 b. Each memory cell array of memory cell arrays 712, 714, 716, and 718 has M columns and N rows of ROM cells. M and N are positive integers. In some embodiments, each ROM cell of memory cell arrays 712, 714, 716, and 718 has a configuration similar to one of ROM cells 210-11, 210-12, 210-21, and 210-22 illustrated in FIGS. 2A and 2B. In some embodiments, each memory cell of memory cell array 712, 714, 716, or 718 has a configuration similar to one of ROM cells 210-11, 210-12, 210-21, and 210-22 illustrated in FIGS. 2A and 2B with the omission of conductive lines 272, 274, and 276 and corresponding via plugs for forming word line strapping structures.

Memory cell array 712 is placed between column edge cells 722 a and 722 b along a column direction (e.g., the Y direction); memory cell array 714 is placed between column edge cells 724 a and 724 b along the Y direction; memory cell array 716 is placed between column edge cells 726 a and 726 b along the Y direction; and memory cell array 718 is placed between column edge cells 728 a and 728 b along the Y direction. Four memory cell arrays 712, 714, 716, and 718 are depicted as a non-limiting example. In some embodiments, memory device 700 includes more or less than four memory cell arrays.

Memory device 700 further includes dummy cell regions (identified as “DUMMY” in FIG. 7) and columns of strapping cells 732, 734, and 736 and two columns of edge strapping cells 742 and 744 between various dummy cell regions. Memory cell array 712 is placed between edge strapping cells 742 and strapping cells 732 along a row direction (e.g., the X direction); memory cell arrays 714 is placed between a column of strapping cells 732 and a column of strapping cells 734 along the Y direction; memory cell arrays 716 is placed between a column of strapping cells 734 and a column of strapping cells 736 along the Y direction; and memory cell arrays 718 is placed between a column of strapping cells 736 and a column of edge strapping cells 744 along the Y direction.

In some embodiments, memory device 700 includes a plurality of gate strip and word lines extending along the X direction throughout at least memory cell arrays 712, 714, 716, and 718 and the columns of strapping cells 732, 734, and 736.

In some embodiments, the columns of strapping cells 732, 734, and 736 have a configuration similar to the column of strapping cells 542S, 544S, 546S, and 548S of FIG. 5. In some embodiments, two adjacent strapping cells of the columns of strapping cells 734 corresponding to strapping cells 542S and 544S are separated from two adjacent strapping cells of the columns of strapping cells 732 corresponding to strapping cells 542S and 544S by two rows of ROM cells of memory array 714 and from two adjacent strapping cells of the columns of strapping cells 736 corresponding to strapping cells 542S and 544S by two rows of ROM cells of memory array 716.

In some embodiments, the columns of strapping cells 732, 734, and 736 have a configuration similar to the column of strapping cells 612S, 614S, 616S, and 618S of FIG. 6. In some embodiments, two adjacent strapping cells of the columns of strapping cells 734 corresponding to strapping cells 612S and 614S are separated from two adjacent strapping cells of the columns of strapping cells 732 corresponding to strapping cells 612S and 614S by two rows of ROM cells of memory array 714 and from two adjacent strapping cells of the columns of strapping cells 736 corresponding to strapping cells 612S and 614S by two rows of ROM cells of memory array 716.

In some embodiments, at least one column of the columns of strapping cells 732, 734, and 736 has a configuration similar to the column of strapping cells depicted in FIG. 5, and, at least another one column of the columns of strapping cells 732, 734, and 736 has a configuration similar to the column of strapping cells depicted in FIG. 6.

For example, in some embodiments, the column of strapping cells 734 has a configuration similar to the column of strapping cells 612S, 614S, 616S, and 618S of FIG. 6; and the columns of strapping cells 732 and 736 have a configuration similar to the column of strapping cells 542S, 544S, 546S, and 548S of FIG. 5. In some embodiments, two adjacent strapping cells of the columns of strapping cells 734 corresponding to strapping cells 612S and 614S are separated from two adjacent strapping cells of the columns of strapping cells 732 corresponding to strapping cells 542S and 544S by two rows of ROM cells of memory array 714 and from two adjacent strapping cells of the columns of strapping cells 736 corresponding to strapping cells 542S and 544S by two rows of ROM cells of memory array 716.

In some embodiments, the columns of strapping cells edge strapping cells 742 and 744 are edge well strapping cells. Edge well strapping cells include conductive structures configured to receive one or more biasing voltages and apply the one or more biasing voltage to one or more corresponding well regions used to form the transistors of Memory device 700. In some embodiments, the columns of strapping cells edge strapping cells 742 and 744 are combined edge strapping cells, and each one of the combined edge strapping cells includes an edge well strapping cell and a strapping cell depicted in FIG. 6.

In accordance with one embodiment, a memory circuit includes a first memory cell and a second memory adjacent to the first memory cell. The first memory cell includes a pass device; a word line segment; a first word line strapping line segment electrically coupled with the pass device of the first memory cell and the word line segment of the first memory cell; and a second word line strapping line segment. The second memory cell includes a pass device; a word line segment; a first word line strapping line segment; and a second word line strapping line segment electrically coupled with the pass device of the second memory cell and the word line segment of the second memory cell. The first word line strapping line segment of the first memory cell and the first word line strapping line segment of the second memory cell are connected with each other at a first interconnection layer of the memory circuit. The second word line strapping line segment of the first memory cell and the second word line strapping line segment of the second memory cell are connected with each other at the first interconnection layer of the memory circuit.

In accordance with another embodiment, a memory circuit includes a first memory cell, a second memory cell adjacent to the first memory cell, a third memory cell, a fourth memory cell adjacent to the third memory cell, a first strapping cell between the first memory cell and the third memory cell, and a second strapping cell between the second memory cell and the fourth memory cell. The first memory cell includes a pass device and a word line segment. The second memory cell includes a pass device and a word line segment. The third memory cell includes a pass device and a word line segment. The fourth memory cell includes a pass device and a word line segment. The first strapping cell includes a first gate structure connecting a gate structure of the pass device of the first memory cell and a gate structure of the pass device of the third memory cell; a word line segment connecting the word line segment of the first memory cell and the word line segment of the third memory cell; a first word line strapping line segment electrically coupled with the first gate structure of the first strapping cell and the word line segment of the first strapping cell; and a second word line strapping line segment. The second strapping cell includes a first gate structure connecting a gate structure of the pass device of the second memory cell and a gate structure of the pass device of the fourth memory cell; a word line segment connecting the word line segment of the second memory cell and the word line segment of the fourth memory cell; a first word line strapping line segment; and a second word line strapping line segment electrically coupled with the first gate structure of the second strapping cell and the word line segment of the second strapping cell. The first word line strapping line segment of the first strapping cell and the first word line strapping line segment of the second strapping cell are connected with each other at a first interconnection layer of the memory circuit. The second word line strapping line segment of the first strapping cell and the second word line strapping line segment of the second strapping cell are connected with each other at the first interconnection layer of the memory circuit.

In accordance with another embodiment, a memory circuit includes a memory circuit includes a first memory cell, a second memory cell adjacent to the first memory cell, a third memory cell, a fourth memory cell adjacent to the third memory cell, a first strapping cell between the first memory cell and the third memory cell, and a second strapping cell between the second memory cell and the fourth memory cell. The first memory cell includes a pass device; an isolation device; and a word line segment. The second memory cell includes a pass device; an isolation device; and a word line segment. The third memory cell includes a pass device; an isolation device; and a word line segment. The fourth memory cell includes a pass device; an isolation device; and a word line segment. The first strapping cell includes a first gate structure connecting a gate of the pass device of the first memory cell and a gate of the pass device of the third memory cell; a second gate structure connecting a gate of the isolation device of the first memory cell and a gate of the isolation device of the third memory cell; a word line segment connecting the word line segment of the first memory cell and the word line segment of the third memory cell; a word line strapping line segment electrically coupled with the first gate structure of the first strapping cell and the word line segment of the first strapping cell; and an isolation gate strapping line segment electrically coupled with the second gate structure of the first strapping cell. The second strapping cell includes a first gate structure connecting a gate of the pass device of the second memory cell and a gate of the pass device of the fourth memory cell; a second gate structure connecting a gate of the isolation device of the second memory cell and a gate of the isolation device of the fourth memory cell; a word line segment connecting the word line segment of the second memory cell and the word line segment of the fourth memory cell; a word line strapping line segment electrically coupled with the first gate structure of the second strapping cell and the word line segment of the second strapping cell; and an isolation gate strapping line segment electrically coupled with the second gate structure of the second strapping cell. The isolation gate strapping line segment of the first strapping cell and the isolation gate strapping line segment of the first strapping cell are connected with each other at a first interconnection layer of the memory circuit. The word line strapping line segment of the first strapping cell is at the first interconnection layer of the memory circuit. The word line strapping line segment of the second strapping cell is at the first interconnection layer of the memory circuit.

A number of embodiments have been described. It will nevertheless be understood that various modifications may be made without departing from the spirit and scope of the disclosure. For example, various transistors being shown as a particular dopant type (e.g., N-type or P-type Metal Oxide Semiconductor (NMOS or PMOS)) are for illustration purposes. Embodiments of the disclosure are not limited to a particular type. Selecting different dopant types for a particular transistor is within the scope of various embodiments. The low or high logic value of various signals used in the above description is also for illustration. Various embodiments are not limited to a particular logic value when a signal is activated and/or deactivated. Selecting different logic values is within the scope of various embodiments. In various embodiments, a source terminal of a transistor can be configured as a drain terminal, and a drain terminal can be configured as a source terminal.

The foregoing outlines features of several embodiments so that those skilled in the art may better understand the aspects of the present disclosure. Those skilled in the art should appreciate that they may readily use the present disclosure as a basis for designing or modifying other processes and structures for carrying out the same purposes and/or achieving the same advantages of the embodiments introduced herein. Those skilled in the art should also realize that such equivalent constructions do not depart from the spirit and scope of the present disclosure, and that they may make various changes, substitutions, and alterations herein without departing from the spirit and scope of the present disclosure. 

What is claimed is:
 1. A memory array comprising: a first memory cell comprising a first pass transistor; a second memory cell adjacent the first memory cell comprising a second pass transistor; a first word line strapping line in a first metallization layer and electrically connecting a gate of the first pass transistor to a first word line and a gate of the second pass transistor to the first word line, the first word line being disposed in a second metallization layer over the first metallization layer, wherein the first word line strapping line extends into the first memory cell and the second memory cell, and wherein the first word line strapping line extends over a second word line different than the first word line.
 2. The memory array of claim 1, wherein the first word line strapping line is free of electrical connection to the second word line.
 3. The memory array of claim 1, further comprising a third memory cell adjacent the first memory cell and a fourth memory cell adjacent the second memory cell, wherein the first word line strapping line extends into the third memory cell and fourth memory cell.
 4. The memory array of claim 3, wherein the first memory cell and the third memory cell are disposed in a same column of the memory array.
 5. The memory array of claim 3, further comprising a second word line strapping line, wherein the third memory cell comprises a third pass transistor and wherein the second word line is electrically connected to a gate of the third pass transistor by the second word line strapping line.
 6. The memory array of claim 1, further comprising a first bit line in the first metallization layer extending into the first memory cell and electrically connected to the first pass transistor, and further comprising a second bit line in the first metallization layer extending into the second memory cell and electrically connected to the second pass transistor.
 7. The memory array of claim 1, further comprising a third word line strapping line electrically connected to the second word line, wherein the first word line extends over the third word line strapping line.
 8. The memory array of claim 1, further comprising: a via contacting the first word line strapping line and the first word line; and a gate contact contacting the first word line strapping line and the gate of the first pass transistor.
 9. A memory device comprising: a first gate structure extending in a first direction; a second gate structure adjacent to the first gate structure and extending in the first direction; a first word line disposed above the first gate structure, the first word line extending in the first direction; a second word line disposed above the second gate structure, the second word line adjacent the first word line and extending in the first direction; a first word line strapping segment electrically connecting the first word line to the first gate structure; a second word line strapping segment electrically connecting the second word line to the second gate structure, wherein the second word line strapping segment is adjacent the first word line strapping segment; a first pass device comprising a gate connected to the first gate structure, wherein the first pass device is adjacent the first word line strapping segment; and a second pass device comprising a gate connected to the second gate structure, wherein the second pass device is adjacent the second word line strapping segment, wherein the second pass device is opposite the second word line strapping segment from the first word line strapping segment.
 10. The memory device of claim 9, wherein the first word line strapping segment is free of electrical connection to the second word line.
 11. The memory device of claim 9, wherein the first word line extends over the second word line strapping segment.
 12. The memory device of claim 9, wherein the first word line strapping segment and the second word line strapping segment extend in a second direction that is orthogonal to the first direction.
 13. The memory device of claim 12, wherein the second word line strapping segment is offset in the first direction from the first word line strapping segment.
 14. The memory device of claim 9, further comprising a first isolation device and further comprising a third gate structure adjacent to the first gate structure and extending in the first direction, wherein a gate of the first isolation device is electrically connected to the third gate structure.
 15. The memory device of claim 9, wherein the gate of the first isolation device is electrically connected to the third gate structure by an isolation gate strapping line segment.
 16. A method comprising: forming a plurality of first fin structures over a substrate; forming a plurality of second fin structures over a substrate; forming a gate structure extending over the plurality of first fin structures and the plurality of second fin structures; forming a plurality of gate contact structures over and electrically connected to the gate structure; forming a plurality of first via plugs in a first via layer over the plurality of gate contact structures, the plurality of first via plugs electrically connected to the plurality of gate contact structures; forming a plurality of word line strapping lines in a first interconnection layer over the first via layer, the plurality of word line strapping lines electrically connected to the plurality of first via plugs; forming a plurality of second via plugs in a second via layer over the plurality of word line strapping lines, the plurality of second via plugs electrically connected to the plurality of word line strapping lines; and forming a plurality of word lines in a second interconnection layer over the second via layer, the plurality of word lines electrically connected to the plurality of second via plugs.
 17. The method of claim 16, wherein a first word line of the plurality of word lines is electrically connected to a first word line strapping line of the plurality of word line strapping lines, wherein a second word line of the plurality of word lines adjacent to the first word line is electrically connected to a second word line strapping line of the plurality of word line strapping lines adjacent to the first word line strapping line.
 18. The method of claim 17, wherein the first word line is free of electrical connection to the second word line strapping line.
 19. The method of claim 17, wherein the first word line extends over the second word line strapping line.
 20. The method of claim 16, further comprising: disposing a first reference voltage line in the first interconnection layer; and disposing a second reference voltage line in the second interconnection layer, the first reference voltage line extending in a direction orthogonal to that of the second reference voltage line. 